| 摘要 |
Disclosed is a plasma processing apparatus. The plasma processing apparatus (1) according to one embodiment of the present invention comprises: first and second chambers (110, 120) which are independently disposed from each other; a unit chamber assembly (100) for plasma-processing a substrate (10) to be inserted therein; and a unit plasma electrode (200) which has a curved shape and generates the plasma to the first and second chambers (110, 120). |
