发明名称 PLASMA TORCH FOR FABRICATING A SILICA-GLASS AND PROCESS CHAMBER WITH THE SAME
摘要 PURPOSE: A plasma torch for manufacturing quartz glass and a reacting chamber equipped with the same are provided to improve the purity of anhydrous quartz glass using a plasma heating source instead of oxy-hydrogen flame. CONSTITUTION: A plasma torch for manufacturing quartz glass includes a reactive gas transferring pipe(10) and a plasma forming part. The reactive gas transferring pipe includes a first tube, a second tube, and a third tube. The plasma forming part is combined with the reactive gas transferring pipe and generates and maintains plasma by applying high frequency power. The first tube transfers SiCl_4 gas. The second tube transfers inert gas and surrounds the first tube. The third tube transfers oxygen gas and surrounds the second tube.
申请公布号 KR20110119917(A) 申请公布日期 2011.11.03
申请号 KR20100039334 申请日期 2010.04.28
申请人 KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY 发明人 KIM, HYEONG JUN;LIM, TAE YOUNG;LEE, SUNG MIN;YOON, KYOUNG HAN
分类号 C03B20/00 主分类号 C03B20/00
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