发明名称 SEMICONDUCTOR MATERIAL MANUFACTURE
摘要 Electronic apparatus, systems, and methods include a semiconductor layer bonded to a bulk region of a wafer or a substrate, in which the semiconductor layer can be bonded to the bulk region using electromagnetic radiation. Additional apparatus, systems, and methods are disclosed.
申请公布号 KR20110120310(A) 申请公布日期 2011.11.03
申请号 KR20117020521 申请日期 2010.02.04
申请人 MICRON TECHNOLOGY, INC. 发明人 SINHA NISHANT;SANDHU GURTEJ S.;SMYTHE JOHN
分类号 H01L21/20 主分类号 H01L21/20
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