PROCESS FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

摘要

Provision of a process for producing an EUV mask blank wherein formation of scars of a glass substrate surface or a chuck surface due to sandwiching of foreign objects such as particles between an electrostatic chuck and the glass substrate, is suppressed. A process for producing an EUV mask blank wherein an electrostatic chuck for clamping a glass substrate has a main body and a lower dielectric layer made of an organic polymer film, and electrode portion made of an electrically conductive material and an upper dielectric layer made of an organic polymer film provided in this order on the main body, wherein the upper dielectric layer includes an anode and a cathode.