| 摘要 |
<p>PURPOSE: A lithography apparatus and a product manufacturing method are provided to arrange a light shielding plate on a wafer, thereby shielding incident light projected to a surrounding part of the wafer during an exposure process. CONSTITUTION: A light shielding plate(9) defies a transfer region of a substrate. The boundary of the light shielding plate includes a circular arc overlapped with a circular border line arranged in the inner circumferential side of the substrate. A first driving unit(96) rotates the light shielding plate with respect to an axis parallel to an optical axis of an illumination system. A second driving unit(95) linearly drives the light shielding plate within a plane orthogonal to the optical axis of the illumination system. A control part controls the first driving unit and second driving unit.</p> |
