| 摘要 |
PURPOSE: A substrate inspection apparatus and method are provided to accurately extract and inspect a defective area without influence of interference patterns formed in a substrate. CONSTITUTION: A substrate inspection apparatus comprises a lighting part(20), a camera part(40), and a control part. The lighting part irradiates light on a substrate. The camera part obtains image information on the substrate. The control part blurs the image information in order to remove interference patterns formed in the image information.
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