| 发明名称 |
Photoacid generators and photoresists comprising same |
| 摘要 |
<p>New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure -C(=O)N<. Photoresist compositions also are provided that comprise one or more PAGs of the invention.</p> |
| 申请公布号 |
EP2383611(A2) |
申请公布日期 |
2011.11.02 |
| 申请号 |
EP20110163651 |
申请日期 |
2011.04.26 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
BAE, YOUNG CHEOL;CARDOLACCIA, THOMAS;LIU, YI |
| 分类号 |
G03F7/004;C07C309/10;C07C309/12;C07C309/17;C07C381/12;C07D207/27 |
主分类号 |
G03F7/004 |
| 代理机构 |
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