| 摘要 |
PURPOSE: A substrate inspection apparatus and method are provided to discriminate whether a defect shown in a substrate image is a defect existing in a substrate or a defect of a light source or inspection apparatus reflected on the substrate. CONSTITUTION: A substrate inspection apparatus comprises an optical system(20), a camera(30), a substrate stage(10), a driving unit(11), a defect candidate point determining unit(40), and a defect determining unit(50). The optical system irradiates light on a substrate. The camera obtains image information of the substrate. The substrate stage loads the substrate. The driving unit transfers one of the camera and the substrate stage. The defect candidate point determining unit extracts a defect candidate point from the image information and determines the position change of the defect candidate point. The defect determining unit determines the defect candidate point as defect when the difference between the position change of the substrate with respect to the camera and the position change of the defect candidate is within a set range.
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