<p>The invention relates to an apparatus for treating an object using a plasma process. The apparatus comprises a plasma reactor including a metal cylinder covered by a dielectric layer. Further, the apparatus comprises an electrode structure arranged radially outside the metal cylinder for generating the plasma process. The apparatus also comprises a supporting structure for locating the object to be treated at a pre-defined distance from the plasma reactor.</p>
申请公布号
EP2382849(A1)
申请公布日期
2011.11.02
申请号
EP20090796104
申请日期
2009.12.29
申请人
NEDERLANDSE ORGANISATIE VOOR TOEGEPAST -NATUURWETENSCHAPPELIJK ONDERZOEK TNO