Method of forming a pattern on a substrate

摘要

Method of forming a pattern on a substrate (20) using an imprint lithography patterned template (12), said method comprising positioning the patterned template (12) and the substrate (20) in a spaced relationship by positioning the patterned template (12) over the substrate (20), wherein the patterned template (12) is substantially non-parallel to the substrate (20), and moving the patterned template (12) toward the substrate, wherein the patterned template (12) remains in a substantially non-parallel orientation with respect to the substrate (20) as the template (12) is moved toward the substrate (20), a liquid on the substrate (20) filling a gap (31) between the patterned template (12) and the substrate (20) as the patterned template (12) is moved toward the substrate (20).