| 发明名称 |
SUBSTRATE CARRYING APPARATUS, SUBSTRATE CARRYING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE |
| 摘要 |
A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate. |
| 申请公布号 |
KR20110119794(A) |
申请公布日期 |
2011.11.02 |
| 申请号 |
KR20117021338 |
申请日期 |
2004.10.07 |
| 申请人 |
NIKON CORPORATION;ZAO NIKON CO., LTD. |
发明人 |
OHTA ATSUSHI;HORIUCHI TAKASHI |
| 分类号 |
H01L21/027;G03F7/20;H01L21/677 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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