磁性材料之乾蚀刻方法,申请号TW093121022-传众专利搜索

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发明名称	磁性材料之乾蚀刻方法
摘要
申请公布号	TWI351445	申请公布日期	2011.11.01
申请号	TW093121022	申请日期	2004.07.14
申请人	佳能安內華股份有限公司日本	发明人	小平吉三;广见太一
分类号	C23F4/00	主分类号	C23F4/00
代理机构		代理人	林志刚台北市中山区南京东路2段125号7楼
主权项	一种磁性材料之乾蚀刻方法，其特征为，使用具有至少1个以上羟基之醇为蚀刻气体，形成该蚀刻气体之电浆，使用由非有机系材料所形成之光罩材料，乾蚀刻磁性材料。
地址	日本

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