FABRICATING METHOD FOR ANTIREFLECTION SUBWAVELENGTH GRATING NANOSTRUCTURE AND FABRICATING METHOD FOR OPTOELECTRONIC DEVICE WITH ANTIREFLECTION LAYER

摘要

PURPOSE: A method for forming a lattice micro structure and a method for manufacturing a non-reflection layer are provided to enhance the production of an optical device which has a low reflectivity property and reduce the reflectivity of an optical device by effectively offering a lattice micro structure below an anti-reflective wavelength which has an improved height and shape. CONSTITUTION: A lattice pattern(13) is formed on the surface of a transparent film(11), which is laminated on a substrate(10), in a cycle below an optical wavelength. The surface of the transparent film is etched. A micro lattice seed(15), which is arranged in a cycle below the optical wavelength in the surface of the transparent film, is formed. A material like the transparent film is deposited in a minute lattice seed. A lattice micro structure(16) below an anti-reflective coating optical wavelength, which is arranged in a cycle below the optical wavelength on the transparent film, is formed.