发明名称 Photovoltaic device
摘要 In the photovoltaic devices comprising a substantially intrinsic amorphous silicon layer containing hydrogen between an n-type single-crystal silicon substrate and a p-type amorphous silicon layer containing hydrogen, the photovoltaic device according to the present invention comprises a trap layer that contains less hydrogen than the intrinsic amorphous silicon layer between the p-type amorphous silicon layer and the intrinsic amorphous silicon layer. The trap layer reduces hydrogen diffusion from the intrinsic amorphous silicon layer to the p-type amorphous silicon layer.
申请公布号 US8049101(B2) 申请公布日期 2011.11.01
申请号 US20050237788 申请日期 2005.09.29
申请人 SANYO ELECTRIC CO., LTD. 发明人 TERAKAWA AKIRA
分类号 H01L31/042 主分类号 H01L31/042
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