发明名称 |
Method and apparatus for removing radiation side lobes |
摘要 |
A method and structure for removing side lobes is provided by positioning first and second radiation transparent regions of respective first and second phases at a first plane with the first and second phases being substantially out of phase. Further, positioning the first and the second region to cause radiation at a second plane to be neutralized in a first region, not to be neutralized in a second region, and to have a side lobe in a third region. Further, positioning a non-transparent region at the first plane to assure radiation at the second plane to be neutralized in the first region and positioning a third radiation transparent region of the first or second phase at the first plane to neutralize the side lobes in the third region at the second plane.
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申请公布号 |
US8048588(B2) |
申请公布日期 |
2011.11.01 |
申请号 |
US20040970077 |
申请日期 |
2004.10.20 |
申请人 |
GLOBALFOUNDRIES SINGAPORE PTE. LTD. |
发明人 |
TAN SIA KIM;TAN SOON YOENG;LIN QUNYING;CHONG HUEY MING;HSIA LIANG-CHOO |
分类号 |
G03F1/00;G03C5/00;G06F17/50 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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