发明名称 |
Vacuum processing apparatus |
摘要 |
A plasma processing apparatus which contributes to reducing required time for maintenance and thereby to enhancing the efficiency of processing and that of apparatus operation is to be provided. A vacuum processing apparatus comprises a vacuum vessel in which a substrate-shaped sample is arranged in an internally arranged processing chamber in which the pressure is reduced; a transfer chamber to which the vacuum vessel is linked and through whose inside reduced in pressure the sample is transferred; a passage which establishes communication between the transfer chamber and the vacuum vessel in a state in which the transfer chamber and the processing chamber are linked to each other and through whose inside the sample not yet processed or already processed is transferred; and a covering member which is removably coupled to cover the internal wall face of the passage, wherein the sample is processed within the processing chamber with a plasma formed in the processing chamber.
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申请公布号 |
US8048259(B2) |
申请公布日期 |
2011.11.01 |
申请号 |
US20060512309 |
申请日期 |
2006.08.30 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
KOBAYASHI MICHIAKI;NAKAMURA TSUTOMU;UCHINO TAKEO;MAKINO AKITAKA;NAKAGOME MASASHI |
分类号 |
C23F1/00;C23C14/00;C23C16/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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