发明名称 SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 There is provided a sulfonium salt having high photosensitivity to the i--line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R 1 to R 6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy (poly) alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m 1 to m 6 each represent the number of occurrences of each of R 1 to R 6 , m 1 , m 4 , and m 6 each represent an integer of 0 to 5, m 2 , m 3 , and m 5 each represent an integer of 0 to 4, and X - represents a monovalent polyatomic anion].
申请公布号 KR20110118821(A) 申请公布日期 2011.11.01
申请号 KR20117021693 申请日期 2010.02.04
申请人 SAN-APRO LIMITED 发明人 SUZUKI ISSEI;KIMURA HIDEKI
分类号 C07C381/12;C08L25/00;G03F7/039;H01L21/027 主分类号 C07C381/12
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