发明名称 |
SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF |
摘要 |
<p>IN A DISPLAY DEVICE SUCH AS A LIQUID CRYSTAL DISPLAY DEVICE, A LARGE-SIZED DISPLAY SCREEN IS REALIZED UNDER LOW POWER CONSUMPTION. A SURFACE OF A SOURCE WIRING LINE OF A PIXEL PORTION EMPLOYED IN AN ACTIVE MATRIX TYPE LIQUID CRYSTAL DISPLAY DEVICE IS PROCESSED BY WAY OF A PLATING PROCESS OPERATION SO AS TO LOWER A RESISTANCE VALUE OF THIS SOURCE WIRING LINE. THE SOURCE WIRING LINE OF THE PIXEL PORTION IS MANUFACTURED AT A STEP DIFFERENT FROM A STEP FOR MANUFACTURING A SOURCE WIRING LINE OF A DRIVE CIRCUIT PORTION. FURTHER, ELECTRODES OF A TERMINAL PORTION ARE PROCESSED BY A PLATING PROCESS OPERATION SO AS TO REDUCE A RESISTANCE VALUE THEREOF</p> |
申请公布号 |
MY144716(A) |
申请公布日期 |
2011.10.31 |
申请号 |
MY2001PI05500 |
申请日期 |
2001.12.03 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
SHUNPEI YAMAZAKI;JUN KOYAMA;HIDEOKI KUWABARA;SAISHI FUJIKAWA |
分类号 |
G02F1/136;H01L29/04;G02F1/1362;H01L21/77;H01L21/84;H01L27/12 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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