发明名称 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS
摘要 <p>An illumination syste comprising a polarization member which comprises first and second polarization mod ers each connected to an actuator configured to move a respective polarization mo er into at least partial intersection with a radiation beam such that the polarization mod ier applies a modified polarization to at least part of the radiation beam, and an array of i dividually controllable reflective elements which is positioned to receive the radiation am after it has passed the polarization member, the illumination system further compn ng a controller capable of controlling the actuators such that the first and second olarization modifiers intersect with different portions of the radiation beam.[Figure 1]An illumination system comprising a polarization member which comprises first and second polarization modifiers each connected to an actuator configured to move a respective polarization modifier into at least partial intersection with a radiation beam such that the polarization modifier applies a modified polarization to at least part of the radiation beam, and an array of individually controllable reflective elements which is positioned to receive the radiation beam after it has passed the polarization member, the illumination system further comprising a controller capable of controlling the actuators such that the first and second polarization modifiers intersect with different portions of the radiation beam.[Figure 1]</p>
申请公布号 SG174692(A1) 申请公布日期 2011.10.28
申请号 SG20110017605 申请日期 2011.03.10
申请人 ASML NETHERLANDS B.V.;CARL ZEISS SMT AG 发明人 HEINE MELLE MULDER;STEVEN GEORGE HANSEN;JOHANNES CATHARINUS HUBERTUS MULKENS;MARKUS DEGUENTHER
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