发明名称 |
SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, AND POWER SUPPLY DEVICE |
摘要 |
<p>Disclosed is a semiconductor device which comprises: a substrate (1); a first nitride semiconductor layer (5) that is formed above the substrate and has a nitrogen polar surface; a gate electrode (10) that is formed above the first nitride semiconductor layer; and a semiconductor layer (7) that is formed on the first nitride semiconductor layer only in a region below the gate electrode and exhibits polarization. Consequently, normally-off operation can be achieved.</p> |
申请公布号 |
WO2011132284(A1) |
申请公布日期 |
2011.10.27 |
申请号 |
WO2010JP57140 |
申请日期 |
2010.04.22 |
申请人 |
FUJITSU LIMITED;SHIMIZU, SANAE;YAMADA, ATSUSHI |
发明人 |
SHIMIZU, SANAE;YAMADA, ATSUSHI |
分类号 |
H01L21/338;H01L21/20;H01L29/778;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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