发明名称 SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, AND POWER SUPPLY DEVICE
摘要 <p>Disclosed is a semiconductor device which comprises: a substrate (1); a first nitride semiconductor layer (5) that is formed above the substrate and has a nitrogen polar surface; a gate electrode (10) that is formed above the first nitride semiconductor layer; and a semiconductor layer (7) that is formed on the first nitride semiconductor layer only in a region below the gate electrode and exhibits polarization. Consequently, normally-off operation can be achieved.</p>
申请公布号 WO2011132284(A1) 申请公布日期 2011.10.27
申请号 WO2010JP57140 申请日期 2010.04.22
申请人 FUJITSU LIMITED;SHIMIZU, SANAE;YAMADA, ATSUSHI 发明人 SHIMIZU, SANAE;YAMADA, ATSUSHI
分类号 H01L21/338;H01L21/20;H01L29/778;H01L29/812 主分类号 H01L21/338
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