发明名称 METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITING
摘要 Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.
申请公布号 US2011265049(A1) 申请公布日期 2011.10.27
申请号 US201113174830 申请日期 2011.07.01
申请人 D2S, INC. 发明人 LAPANIK DMITRI;MATSUSHITA SHOHEI;MITSUHASHI TAKASHI;WU ZHIGANG
分类号 G06F17/50 主分类号 G06F17/50
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