发明名称 |
GAS DISTRIBUTION SHOWERHEAD WITH COATING MATERIAL FOR SEMICONDUCTOR PROCESSING |
摘要 |
Described herein are exemplary methods and apparatuses for fabricating a gas distribution showerhead assembly in accordance with one embodiment. In one embodiment, a method includes providing a gas distribution plate having a first set of through-holes for delivering processing gases into a semiconductor processing chamber. The first set of through-holes is located on a backside of the plate (e.g., Aluminum substrate). The method includes spraying (e.g., plasma spraying) a coating material (e.g., Ytrria based material) onto a cleaned surface of the gas distribution plate. The method includes removing (e.g., surface grinding) a portion of the coating material from the surface to reduce a thickness of the coating material. The method includes forming (e.g., UV laser drilling, machining) a second set of through-holes in the coating material such that the through-holes are aligned with the first-set of through-holes. |
申请公布号 |
WO2011100109(A3) |
申请公布日期 |
2011.10.27 |
申请号 |
WO2011US22418 |
申请日期 |
2011.01.25 |
申请人 |
APPLIED MATERIALS, INC.;SUN, JENNIFER;THACH, SENH;DUAN, RENGUAN;GRAVES, THOMAS |
发明人 |
SUN, JENNIFER;THACH, SENH;DUAN, RENGUAN;GRAVES, THOMAS |
分类号 |
H01L21/316;H01L21/205 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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