发明名称 PASSIVATION METHODS AND APPARATUS FOR ACHIEVING ULTRA-LOW SURFACE RECOMBINATION VELOCITIES FOR HIGH-EFFICIENCY SOLAR CELLS
摘要 The disclosed subject matter provides a method and structure for obtaining ultra-low surface recombination velocities from highly efficient surface passivation in crystalline silicon substrate- based solar cells by utilizing a bi-layer passivation scheme which also works as an efficient ARC. The bi-layer passivation consists of a first thin layer of wet chemical oxide or a thin hydrogenated amorphous silicon layer. A second layer of amorphous hydrogenated silicon nitride film is deposited on top of the wet chemical oxide or amorphous silicon film. This deposition is then followed by annealing to further enhance the surface passivation.
申请公布号 WO2011133965(A2) 申请公布日期 2011.10.27
申请号 WO2011US33706 申请日期 2011.04.23
申请人 SOLEXEL, INC.;DESHPANDE, ANAND;RICOLCOL, RAFAEL;SEUTTER, SEAN;KRAMER, KARL-JOSEF;MOSLEHI, MEHRDAD, M. 发明人 DESHPANDE, ANAND;RICOLCOL, RAFAEL;SEUTTER, SEAN;KRAMER, KARL-JOSEF;MOSLEHI, MEHRDAD, M.
分类号 H01L31/18;H01L31/0216;H01L31/042 主分类号 H01L31/18
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