发明名称 MULTILEVEL INTERCONNECT STRUCTURES AND METHODS OF FABRICATING SAME
摘要 A multilevel interconnect structure for a semiconductor device includes an intermetal dielectric layer with funnel-shaped connecting vias. The funnel-shaped connecting vias are provided in connection with systems exhibiting submicron spacings. The architecture of the multilevel interconnect structure provides a low resistance connecting via.
申请公布号 US2011260332(A1) 申请公布日期 2011.10.27
申请号 US201113091330 申请日期 2011.04.21
申请人 STMICROELECTRONICS S.R.L. 发明人 DI FRANCO ANTONIO;CRISTOFALO SILVIO;BONIFACIO MARCO
分类号 H01L23/522;H01L21/306;H01L21/3105;H01L21/311 主分类号 H01L23/522
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