| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving the uniformity of the flatness of an object to be polished.SOLUTION: The polishing pad 10 includes a resin sheet 2 integrally formed of two types of resin having solubility against polar solvent by means of the wet solidification method. The resin sheet 2 is formed so that a polishing section 2a having a polishing surface P and formed with many cells 4, a cushion section 2b formed with a plurality of cells 5, and a middle portion 2c not formed with cells 4, 5 and formed with cells 6 are overlaid on another in the thickness direction. Each of the cells 4 has a length in the thickness direction of the resin sheet 2. Each of the cells 5 has a breadth in such a direction crossing with the thickness direction and is formed into an average volume larger than that of the cell 4. The cell 6 has an average volume smaller than those of the cells 4, 5. The cushion 2b ensures cushion properties and abrasive grains are pressed against the polishing section 2a. |
