发明名称 |
METHOD OF PRODUCING CURED FILM, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of producing a cured film excellent in patterning property of a contact hole, ITO sputter resistance, and heat resistance transparency, which can be produced at high and stable sensitivity, with slit coating.SOLUTION: The method includes: a process to decrease the temperature of a photosensitive resin composition below 10°C; a process to perform slit coating of the photosensitive resin composition on a substrate; a process to remove solvent from the applied photosensitive resin composition; a process to expose the photosensitive resin composition from which the solvent is removed, with activated light; a process to keep the photosensitive resin composition at room temperature for 45 seconds; a process to develop the photosensitive resin composition with an aqueous developing solution; and a process to thermoset the photosensitive resin composition. The photosensitive resin composition contains: (Component A) a copolymer containing a structural unit including a residue of which acid group is protected by an acid decomposing group, a structural unit including a crosslinking group, and a structural unit including a carboxy group and/or a phenolic hydroxyl group; (Component B) a photoacid generating agent; and (Component C) a solvent. |
申请公布号 |
JP2011215590(A) |
申请公布日期 |
2011.10.27 |
申请号 |
JP20100272330 |
申请日期 |
2010.12.07 |
申请人 |
FUJIFILM CORP |
发明人 |
ANDO TAKESHI;SUGIHARA KOICHI |
分类号 |
G03F7/039;C08F212/14;C08F220/26;G03F7/004;G03F7/38;H01L51/50;H05B33/10;H05B33/12;H05B33/22 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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