发明名称 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, METHOD OF CONTROLLING EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, AND TARGET SUPPLY DEVICE
摘要 PROBLEM TO BE SOLVED: To improve usability and availability of an extreme ultraviolet light source apparatus.SOLUTION: A chamber device is used together with a laser light source 10, and may includes: a chamber 100 provided with at least one incident hole for guiding laser light L1 output from the laser light source 110 into the inside; a target supply unit 120 provided to the chamber 100 and configured to supply a target material 200 to a predetermined position in the chamber 100; a recovery control unit 301 configured to instruct the target supply unit 120 to execute recovery operation when a predetermined condition is met; a recovery unit 400 configured to perform the recovery operation as instructed by the recovery control unit 301; and a position measuring unit 302 configured to measures the position of the target material 200 supplied from the target supply unit 120 into the chamber 100.
申请公布号 JP2011216860(A) 申请公布日期 2011.10.27
申请号 JP20110013014 申请日期 2011.01.25
申请人 KOMATSU LTD;GIGAPHOTON INC 发明人 YABU TAKAYUKI;KAKIZAKI KOJI;WATANABE YUKIO;WAKABAYASHI OSAMU
分类号 H01L21/027;H05G2/00 主分类号 H01L21/027
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