发明名称 |
EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, METHOD OF CONTROLLING EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, AND TARGET SUPPLY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To improve usability and availability of an extreme ultraviolet light source apparatus.SOLUTION: A chamber device is used together with a laser light source 10, and may includes: a chamber 100 provided with at least one incident hole for guiding laser light L1 output from the laser light source 110 into the inside; a target supply unit 120 provided to the chamber 100 and configured to supply a target material 200 to a predetermined position in the chamber 100; a recovery control unit 301 configured to instruct the target supply unit 120 to execute recovery operation when a predetermined condition is met; a recovery unit 400 configured to perform the recovery operation as instructed by the recovery control unit 301; and a position measuring unit 302 configured to measures the position of the target material 200 supplied from the target supply unit 120 into the chamber 100. |
申请公布号 |
JP2011216860(A) |
申请公布日期 |
2011.10.27 |
申请号 |
JP20110013014 |
申请日期 |
2011.01.25 |
申请人 |
KOMATSU LTD;GIGAPHOTON INC |
发明人 |
YABU TAKAYUKI;KAKIZAKI KOJI;WATANABE YUKIO;WAKABAYASHI OSAMU |
分类号 |
H01L21/027;H05G2/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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