CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM

摘要

PROBLEM TO BE SOLVED: To enhance flexibility in the arrangement of various elements with respect to a plasma generation site.SOLUTION: A chamber apparatus is used with an external apparatus having an obscuration region. The chamber apparatus may include: a chamber 10 in which EUV light is generated; a collector mirror 14 provided in the chamber 10 for collecting the extreme ultraviolet light; a support for securing the collector mirror 14 to the chamber 10; and an output port W14 provided to the chamber for allowing the extreme ultraviolet light L2 collected by the collector mirror 10 to be introduced therethrough into the external apparatus.