发明名称 |
NOVEL DUAL-TONE RESIST FORMULATIONS AND METHODS |
摘要 |
Dual tone photoresist formulations comprising a photoacid generator are described and employed in fabrication techniques, including methods of making structures on substrates, and more particularly, methods of making electronic devices (e.g. transistors and the like) on flexible substrates wherein two patterns are formed simultaneously in one layer of photoresist.
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申请公布号 |
US2011262860(A1) |
申请公布日期 |
2011.10.27 |
申请号 |
US201113090502 |
申请日期 |
2011.04.20 |
申请人 |
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS |
发明人 |
WILLSON C. GRANT;JEN WEI-LUN KANE;RAWLINGS BRANDON MARK;STRAHAN JEFFREY RYAN |
分类号 |
G03F7/20;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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