发明名称 |
COMPOSITION OF POLYURETHANE POLISHING PAD MEMBER |
摘要 |
PROBLEM TO BE SOLVED: To provide a polyurethane polishing pad with higher hardness and high durability since durability of a pad and high speed polishing besides polishing accuracy are required in precision polishing field recently.SOLUTION: The polyurethane polishing pad with hardness higher than that of a conventional one and achieving hard finishing is obtained by changing a TDI base isocyanate group-terminated prepolymer to an isocyanate group-terminated prepolymer mainly composed of 2, 4'-diphenylmethane diisocyanate. A problem is solved by allowing the polyurethane polishing pad to have high polishing accuracy and to have both the durability and the polishing speed. |
申请公布号 |
JP2011212775(A) |
申请公布日期 |
2011.10.27 |
申请号 |
JP20100082002 |
申请日期 |
2010.03.31 |
申请人 |
NIPPON POLYURETHANE IND CO LTD |
发明人 |
NOMURA KOJI |
分类号 |
B24B37/24;C08G18/32;C08G101/00;H01L21/304 |
主分类号 |
B24B37/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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