发明名称 COMPOSITION OF POLYURETHANE POLISHING PAD MEMBER
摘要 PROBLEM TO BE SOLVED: To provide a polyurethane polishing pad with higher hardness and high durability since durability of a pad and high speed polishing besides polishing accuracy are required in precision polishing field recently.SOLUTION: The polyurethane polishing pad with hardness higher than that of a conventional one and achieving hard finishing is obtained by changing a TDI base isocyanate group-terminated prepolymer to an isocyanate group-terminated prepolymer mainly composed of 2, 4'-diphenylmethane diisocyanate. A problem is solved by allowing the polyurethane polishing pad to have high polishing accuracy and to have both the durability and the polishing speed.
申请公布号 JP2011212775(A) 申请公布日期 2011.10.27
申请号 JP20100082002 申请日期 2010.03.31
申请人 NIPPON POLYURETHANE IND CO LTD 发明人 NOMURA KOJI
分类号 B24B37/24;C08G18/32;C08G101/00;H01L21/304 主分类号 B24B37/24
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