发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 In one embodiment, a method for manufacturing a semiconductor device is disclosed. The method can include, upon attaching a bonding material containing a resin and a solvent to a second surface opposed to a first surface including a circuit pattern of a wafer, heating the bonding material to evaporate the solvent and decreasing vapor pressure of the solvent in an atmosphere faced with the bonding material and heating the attached bonding material to form a bonding layer.
申请公布号 US2011263131(A1) 申请公布日期 2011.10.27
申请号 US201113008443 申请日期 2011.01.18
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KATAMURA YUKIO;TANE YASUO;YOSHIMURA ATSUSHI;IWAMI FUMIHIRO
分类号 H01L21/302;B05B1/02;B05B15/00 主分类号 H01L21/302
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