BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION MATERIAL MADE OF THE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RELIEF PATTERN AND PRODUCT USING THE PHOTOSENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a basic generator which is easily synthesized, and capable of generating a tertiary amine and amidine of a base with high catalytic activity, and to provide a photosensitive resin composition using the base generator.SOLUTION: This base generator includes a specific structure containing an acid and a base, and generates the base by irradiation of an electromagnetic wave. The photosensitive resin composition includes: the base generator; and a polymeric precursor the reaction of which to an end product is accelerated by a basic substance, or by heating in presence of the basic substance.