METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING MOLD

摘要

PROBLEM TO BE SOLVED: To suppress a substantial increase in necessary exposure intensity while ensuring a high resolution for a resist layer having a predetermined composition.SOLUTION: A method for forming a resist pattern includes steps of: forming a resist layer containing a polymer of α-chloromethacrylate and α-methylstyrene on a substrate; performing rendering or exposure of a predetermined pattern by irradiating the resist layer with an energy beam; and developing the rendered or exposed resist layer with a developer containing n-amyl acetate at ≤5°C.