发明名称 MULTIBEAM EXPOSURE SCANNING METHOD AND APPARATUS, AND METHOD FOR MANUFACTURING PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To effectively reduce influences of heat from an adjacent beam accompanying multibeam exposure and to form a desired shape such as a fine shape with high accuracy.SOLUTION: A multibeam exposure scanning method for engraving a surface of a recording medium is provided, the method comprising irradiating the recording medium with a plurality of beams simultaneously from an exposure head, the exposure head having N levels (where N is an integer equal to or greater than 2) of emitting outlet rows each having emitting outlets arranged at intervals of P in a sub-scanning direction, the N levels being arranged at regular intervals in a main scanning direction perpendicular to the sub-scanning direction, the respective levels being arranged so that respective projected emitting outlets may be located at intervals of P/N when the respective emitting outlets are projected in the main scanning direction. The multibeam exposure scanning method includes steps of: scanning the recording medium in the main scanning direction N times with the exposure head; and emitting beams to a first area from only the emitting outlet row of one level while sequentially switching the levels to emit beams for each main scanning operation, where the surface of the recording medium is divided into a target flat area to be maintained without engraving, the first area to be engraved with precision, and a second area that is the remaining area.
申请公布号 JP2011215273(A) 申请公布日期 2011.10.27
申请号 JP20100081888 申请日期 2010.03.31
申请人 FUJIFILM CORP 发明人 MIYAGAWA ICHIRO
分类号 G03F7/20;B41C1/05 主分类号 G03F7/20
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