发明名称 HIGHLY ABRASION-RESISTANT IMPRINT MATERIAL
摘要 <p>Provided is a highly abrasion-resistant imprint material. The imprint material comprises a compound that has C2-3 alkylene oxide units and at least two polymerizable groups as component (A) and a photopolymerization initiator as component (B). The polymerizable groups are at least one selected from the group consisting of acryloyloxy, acryloyl, methacryloyloxy, and methacryloyl groups. The imprint material can further comprise, in addition to component (A), a compound that has at least two polymerizable groups but does not have C2-3 alkylene oxide units as component (A').</p>
申请公布号 WO2011132616(A1) 申请公布日期 2011.10.27
申请号 WO2011JP59420 申请日期 2011.04.15
申请人 NISSAN CHEMICAL INDUSTRIES, LTD.;KOBAYASHI, JUNPEI;KATO, TAKU;SHUTO, KEISUKE;SUZUKI, MASAYOSHI 发明人 KOBAYASHI, JUNPEI;KATO, TAKU;SHUTO, KEISUKE;SUZUKI, MASAYOSHI
分类号 H01L21/027;C08F2/50;C08F20/28;C08F299/02 主分类号 H01L21/027
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