发明名称 |
NONVOLATILE MEMORY ELEMENT AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a variable resistance layer that is composed of a metal oxide layer containing Hf suitable for a resistance changing operation in a resistance change type nonvolatile memory element.SOLUTION: The nonvolatile memory element has a first electrode, a second electrode, and a variable resistance layer that is interposed between the first electrode and the second electrode so as to have resistance values changing between at least two different resistance states. The variable resistance layer includes a metal oxide layer containing at least Hf and O and has a composition expressed by a Hf and O molar ratio (O/Hf ratio) ranging from 0.30 to 1.90. |
申请公布号 |
JP2011216658(A) |
申请公布日期 |
2011.10.27 |
申请号 |
JP20100083152 |
申请日期 |
2010.03.31 |
申请人 |
CANON ANELVA CORP |
发明人 |
KIN MEGUMI;OTANI YUICHI;NAKAGAWA TAKASHI |
分类号 |
H01L27/10;H01L45/00;H01L49/00 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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