发明名称 |
Amorphous oxide and field effect transistor |
摘要 |
AMORPHOUS OXIDE AND FIELD EFFECT TRANSISTOR Abstract A novel amorphous oxide applicable, for example, to an active layer of a TFT is provided. The amorphous oxide comprises microcrystals and whose composition s- changes in a layer thickness direction and having an electron carrier concentration of 10 2 /cm 3 or more and less than 1018/cm3 and a field effect transistor comprising an active layer of an amorphous oxide whose composition changes in a layer thickness direction. |
申请公布号 |
AU2009200323(B2) |
申请公布日期 |
2011.10.27 |
申请号 |
AU20090200323 |
申请日期 |
2009.01.29 |
申请人 |
CANON KABUSHIKI KAISHA;TOKYO INSTITUTE OF TECHNOLOGY |
发明人 |
HOSONO, HIDEO;KAMIYA, TOSHIO;NOMURA, KENJI;SANO, MASAFUMI;NAKAGAWA, KATSUMI |
分类号 |
H01L29/786;H01L21/363;H01L21/428 |
主分类号 |
H01L29/786 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|