发明名称 Amorphous oxide and field effect transistor
摘要 AMORPHOUS OXIDE AND FIELD EFFECT TRANSISTOR Abstract A novel amorphous oxide applicable, for example, to an active layer of a TFT is provided. The amorphous oxide comprises microcrystals and whose composition s- changes in a layer thickness direction and having an electron carrier concentration of 10 2 /cm 3 or more and less than 1018/cm3 and a field effect transistor comprising an active layer of an amorphous oxide whose composition changes in a layer thickness direction.
申请公布号 AU2009200323(B2) 申请公布日期 2011.10.27
申请号 AU20090200323 申请日期 2009.01.29
申请人 CANON KABUSHIKI KAISHA;TOKYO INSTITUTE OF TECHNOLOGY 发明人 HOSONO, HIDEO;KAMIYA, TOSHIO;NOMURA, KENJI;SANO, MASAFUMI;NAKAGAWA, KATSUMI
分类号 H01L29/786;H01L21/363;H01L21/428 主分类号 H01L29/786
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