发明名称 LOW-POWER GASEOUS PLASMA SOURCE
摘要 A plasma source includes a first rod forming a quarterwave antenna, surrounded by at least one parallel rod forming a coupler and which is substantially the same length as the first rod, set to a reference potential, the coupler rods being evenly distributed radially about the first rod, at a distance of around one-fifth to one-twentieth of the quarter of the wavelength.
申请公布号 US2011260621(A1) 申请公布日期 2011.10.27
申请号 US200913124451 申请日期 2009.10.16
申请人 SORTAIS PASCAL;LAMY THIERRY 发明人 SORTAIS PASCAL;LAMY THIERRY
分类号 H05H1/40;H05H1/24 主分类号 H05H1/40
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