ADDITIVE SUPPLY DEVICE AND EXHAUST PURIFICATION DEVICE
摘要
<p>The disclosed additive supply device (D) is provided with: an addition valve (C) for injecting an additive into an exhaust pathway (B); a pump (F) for pumping the additive to said addition valve (C); and a control means that controls the addition valve (C) and the pump (F). When adding a requested amount of additive, the control means controls at least one of the addition valve (C) and the pump (F) in a manner so as to cyclically alter the spray penetration of the additive injected from the addition valve (C) during the addition of said requested amount of additive.</p>
申请公布号
WO2011132218(A1)
申请公布日期
2011.10.27
申请号
WO2010JP02836
申请日期
2010.04.20
申请人
TOYOTA JIDOSHA KABUSHIKI KAISHA;NAKAYAMA, SHIGEKI;TSUJIMOTO, KENICHI