| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for forming a magnetic recording medium film where PTF can be improved, and to provide a manufacturing method thereof.SOLUTION: The sputtering target contains a composition which contains Cr and Pt, the residual portion composed of Co and inevitable impurities. The structure of the sputtering target is made to be a composite structure of a Co-Cr-Pt grain phase 4 containing Co, Cr, and Pt, and a matrix phase 3 serving as a combining phase containing Pt, Co, Cr, and the inevitable impurities. The Co concentration of the matrix phase 3 is 25 mass% or lower. |
