| 摘要 |
PROBLEM TO BE SOLVED: To improve pattern accuracy in fabricating a substrate with a pedestal in which an alignment mark is formed, by reducing the relative positional deviation of the pedestal from the alignment mark.SOLUTION: A method for fabricating the substrate having the protruding pedestal provided on the first principal surface side and the alignment mark formed on the upper surface of the pedestal includes: a step of forming a hard mask layer with high light reflectance on the first principal surface of the substrate 1 and subsequently forming a hard mask 2a by etching the hard mask layer matched with the outer diameter of the pedestal and the shape of the alignment mark; a step of forming a negative resist layer 6 on the substrate 1 to cover the hard mask 2a; a step of insolubilizing the resist layer 6 located directly above the hard mask 2a by exposing the resist layer 6 by utilizing light reflection by the hard mask 2a; and a step of forming a resist pattern 6a by developing the resist layer 6 and subsequently forming the pedestal by etching the substrate 1 by using the resist pattern 6a as a mask. |
