ETHANOL-, HEAT- OR FURFURAL- RESISTANT YEAST STRAIN, AND GENE THEREOF

摘要

The present invention relates to an ethanol-, heat- or furfural- resistant transformed yeast strain comprising: inactivated CMP2 or IMD4 gene (Tn-1); SSK2 or PPG1 gene (Tn-2); PAM1 gene (Tn-3); DLD3 gene (Tn-4); or MSN2 gene (Tn-5), and a use thereof. The yeast strain of the present invention can grow in high concentrations of ethanol, preferably in high concentrations of ethanol (for example, 5-15%). In addition, the yeast strain of the present invention includes a yeast strain capable of growing even at a high temperature (for example, 42 ? or 43 ?) or even in a high concentration of furfural (for example, 15-50 mM). Therefore, the yeast strain of the present invention can more effectively produce ethanol in conditions of high temperature, high concentration of ethanol and high concentration of furfural which are necessary for an integrated process for overcoming existing ineffective multistep processes.