发明名称 METHOD FOR MANUFACTURING NEGATIVE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a negative photosensitive planographic printing plate having high sensitivity and excellent staining resistance in the negative photosensitive planographic printing plate having at least a hydrophilic layer, a photopolymerizable photosensitive layer, and an over layer in this order on a supporting body.SOLUTION: In the method, the over layer is applied, the applied article is wound on wet conditions of 30 to 50°C and 30 to 70% relative humidity directly after drying and then heated for 24 to 168 hours on conditions of 30 to 50°C and 30 to 70% relative humidity.
申请公布号 JP2011215233(A) 申请公布日期 2011.10.27
申请号 JP20100081355 申请日期 2010.03.31
申请人 MITSUBISHI PAPER MILLS LTD 发明人 OKAMOTO YUKIO
分类号 G03F7/16;G03F7/00;G03F7/11 主分类号 G03F7/16
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