发明名称 METHOD OF ALIGNING PHOTOMASK WITH BASE MATERIAL AND METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD
摘要 An exposure system includes an exposure device and an image processing device. The exposure device includes a plurality of cameras. Each of the cameras is configured so as to be selectively set to a full scan mode and a partial scan mode. The camera transmits all of obtained image data in the full scan mode, and extracts part of the obtained image data and transmits the partial image data in the partial scan mode. The image processing device paratactically performs processing using the image data transmitted from the camera and processing using the image data transmitted from the camera.
申请公布号 US2011262869(A1) 申请公布日期 2011.10.27
申请号 US201113085269 申请日期 2011.04.12
申请人 NITTO DENKO CORPORATION 发明人 MURAKAMI KOUSUKE;ARIMA AKIRA;HATTORI TOMOHIRO;MIYAZAKI SHUUHEI
分类号 G03F7/20;G06K9/00 主分类号 G03F7/20
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