| 摘要 |
<p>A method for the formation of grooves (74, 85) in the surface of a polymer layer substrate (36, 46, 51, 65, 73, 83) by a direct write laser vaporization process, the polymer being selected, or modified by the addition of organic or inorganic material, so that it strongly absorbs wavelengths in the range 525 nm to 535 nm, the method comprising the steps: providing a laser beam (32, 42) with a wavelength in the range 525 nm to 535 nm that has diffraction limited or substantially diffraction limited beam quality and operates either continuously, quasi-continuously or Q-switched, using an optical system (35, 45, 64, 72, 82) to focus the laser beam to a focal spot on the surface of the substrate, using a scanner (44, 63) to move the focal spot relative to an area on the substrate so the substrate surface is vaporized where it is exposed to the beam so as to form a groove with a depth that is less than the thickness of the polymer layer, controlling the scanner so as to change the position of the focal spot on the substrate whereby grooves having straight and curved portions along their length are written on the surface of the substrate, and regulating the power of the laser beam reaching the surface of the substrate so that the writing process is started and stopped whereby grooves of desired lengths are formed.</p> |
