FILM REMOVAL METHOD, PHOTOELECTRIC CONVERSION DEVICE FABRICATION METHOD, PHOTOELECTRIC CONVERSION DEVICE, AND FILM REMOVAL DEVICE

摘要

A film formed on a substrate is radiated with a first light beam to separate the film into a plurality of regions. Repairing is carried out by removing the film at a removal deficient site where the film remains between the plurality of regions. A film removal method allowing separation of a film into a plurality of regions at high yield, a method for fabricating a photoelectric conversion device using the film removal method, and a film removal device can be provided.