发明名称 |
Fluid handling structure and lithographic apparatus |
摘要 |
<p>A fluid handling structure (12) for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space (11) configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings (50) arranged in a first line that, in use, are directed towards a substrate (W) and/or a substrate table (WT) configured to support the substrate; a gas knife device (60) having an elongate aperture (61) in a second line; and an elongate opening or a plurality of openings (302) adjacent the gas knife device.</p> |
申请公布号 |
EP2381310(A1) |
申请公布日期 |
2011.10.26 |
申请号 |
EP20110156770 |
申请日期 |
2011.03.03 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
CORTIE, ROGIER;LIEBREGTS, PAULUS;RIEPEN, MICHEL;EVANGELISTA, FABRIZIO |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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