发明名称 FABRICATION OF SIC SUBSTRATES WITH LOW WARP AND BOW
摘要 A method of fabricating an SiC single crystal includes (a) physical vapor transport (PVT) growing a SiC single crystal on a seed crystal in the presence of a temperature gradient, wherein an early-to-grow portion of the SiC single crystal is at a lower temperature than a later-to-grow portion of the SiC single crystal. Once grown, the SiC single crystal is annealed in the presence of a reverse temperature gradient, wherein the later-to-grow portion of the SiC single crystal is at a lower temperature than the early-to-grow portion of the SiC single crystal.
申请公布号 EP2171134(A4) 申请公布日期 2011.10.26
申请号 EP20080772027 申请日期 2008.06.26
申请人 II-VI INCORPORATED 发明人 WU, PING;ZWIEBACK, ILYA;GUPTA, AVINESH, K.;SEMENAS, EDWARD
分类号 C30B23/00;C30B23/06;C30B29/36;C30B33/02 主分类号 C30B23/00
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