| 发明名称 |
Resistor and design structure having resistor material length with sub-lithographic width |
| 摘要 |
A resistor and design structure including at least one resistor material length in a dielectric, each of the least one resistor material length having a sub-lithographic width are disclosed.
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| 申请公布号 |
US8044764(B2) |
申请公布日期 |
2011.10.25 |
| 申请号 |
US20080046647 |
申请日期 |
2008.03.12 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HAKEY MARK C.;LUCE STEPHEN E.;NAKOS JAMES S. |
| 分类号 |
H01C1/012 |
主分类号 |
H01C1/012 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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