发明名称 |
Methods for forming gas barriers on electronic devices |
摘要 |
A method for forming gas barriers on electronic devices is provided. The fabrication method includes: providing a first substrate having at least one electronic device thereon; providing a second substrate and forming a gas barrier over the second substrate; disposing the second substrate over the first substrate, wherein the gas barrier faces the electronic device; providing an electromagnetic wave light source over the second substrate; and irradiating the second substrate by the electromagnetic wave light source to transfer the gas barrier to the electronic device and cover the electronic device.
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申请公布号 |
US8043462(B2) |
申请公布日期 |
2011.10.25 |
申请号 |
US20090416664 |
申请日期 |
2009.04.01 |
申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
CHEN HUI-TA;CHANG CHUN-HAO;LIU SUNG-HO;TSENG CHUN-HAO |
分类号 |
B29C65/16;B29C65/48;B29C65/54;B32B37/06;B32B37/14;B32B38/10;H01L21/027 |
主分类号 |
B29C65/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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