发明名称 Methods for forming gas barriers on electronic devices
摘要 A method for forming gas barriers on electronic devices is provided. The fabrication method includes: providing a first substrate having at least one electronic device thereon; providing a second substrate and forming a gas barrier over the second substrate; disposing the second substrate over the first substrate, wherein the gas barrier faces the electronic device; providing an electromagnetic wave light source over the second substrate; and irradiating the second substrate by the electromagnetic wave light source to transfer the gas barrier to the electronic device and cover the electronic device.
申请公布号 US8043462(B2) 申请公布日期 2011.10.25
申请号 US20090416664 申请日期 2009.04.01
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN HUI-TA;CHANG CHUN-HAO;LIU SUNG-HO;TSENG CHUN-HAO
分类号 B29C65/16;B29C65/48;B29C65/54;B32B37/06;B32B37/14;B32B38/10;H01L21/027 主分类号 B29C65/16
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